Threshold Limit Values
"Threshold Limit Values" is a descriptor in the National Library of Medicine's controlled vocabulary thesaurus,
MeSH (Medical Subject Headings). Descriptors are arranged in a hierarchical structure,
which enables searching at various levels of specificity.
Standards for limiting worker exposure to airborne contaminants. They are the maximum concentration in air at which it is believed that a particular substance will not produce adverse health effects with repeated daily exposure. It can be a time-weighted average (TLV-TWA), a short-term value (TLV-STEL), or an instantaneous value (TLV-Ceiling). They are expressed either as parts per million (ppm) or milligram per cubic meter (mg/m3).
Descriptor ID |
D020711
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MeSH Number(s) |
N03.706.615.917 N06.850.460.350.600.807
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Concept/Terms |
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Below are MeSH descriptors whose meaning is more general than "Threshold Limit Values".
Below are MeSH descriptors whose meaning is more specific than "Threshold Limit Values".
This graph shows the total number of publications written about "Threshold Limit Values" by people in this website by year, and whether "Threshold Limit Values" was a major or minor topic of these publications.
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Year | Major Topic | Minor Topic | Total |
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2018 | 0 | 1 | 1 |
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Below are the most recent publications written about "Threshold Limit Values" by people in Profiles.
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Peters MJ, Woolfall K, Khan I, Deja E, Mouncey PR, Wulff J, Mason A, Agbeko RS, Draper ES, Fenn B, Gould DW, Koelewyn A, Klein N, Mackerness C, Martin S, O'Neill L, Ray S, Ramnarayan P, Tibby S, Thorburn K, Tume L, Watkins J, Wellman P, Harrison DA, Rowan KM. Permissive versus restrictive temperature thresholds in critically ill children with fever and infection: a multicentre randomized clinical pilot trial. Crit Care. 2019 03 07; 23(1):69.
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Lynch HN, Prueitt RL, Goodman JE. Critique of the ACGIH 2016 derivation of toluene diisocyanate Threshold Limit Values. Regul Toxicol Pharmacol. 2018 Aug; 97:189-196.
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Gaffney S, Moody E, McKinley M, Knutsen J, Madl A, Paustenbach D. Worker exposure to methanol vapors during cleaning of semiconductor wafers in a manufacturing setting. J Occup Environ Hyg. 2008 May; 5(5):313-24.
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